Achievements
Awards
Professor Samukawa receives the JASP Best Paper Award!
In fiscal 2001, Professor Samukawa received the JASP Best Paper Award (Tutorial Paper Award). The award ceremony was held at Aichi Institute of Technology at the autumn JSAP meeting, at which time Professor Samukawa also gave a commemorative lecture. The award was given for a paper that appeared in the Japanese Journal of Applied Physcis, 39 (2000) 1583 titled "Effects of Discharge Frequency in Plasma Etching and Ultrahigh-Frequency Plasma Source for High-Performance Etching for ULSIs." The paper, which concerns UHF plasma discovered and developed by Professor Samukawa in 1995, was written in cooperation with his research collaborators, Dr. Vincent Donnelly and Dr. Mikhail Malyshev (Bell Laboratories, Lucent Technologies Inc.). The paper demonstrates that when the discharge frequency is set at UHF band (500MHz), which is higher than the electron collision frequency, the generated plasma has a different two-electron temperature distribution than conventional plasma. This controls the degree of dissociation in the plasma, making it possible to perform extremely precise etching on ULSI. These results were highly praised by the American Vacuum Society (AVS) and European scientific societies, resulting in many invitations for Professor Samukawa to give presentations.
Words of Appreciation from Professor Samukawa
I am indebted to the following people for the development of the UHF plasma source and for my understanding of UHF plasma: Yukito Nakagawa, Tsutomu Tsukada, Yutaka Nogami (ANELVA), Kibatsu Shinohara, Hiroyuki Ueyama, Tsugio Imayoshi (Japan High Frequency), Hiroto Ohtake, Ken'ichiro Tsuda, Takashi Mizutani (NEC), Kazuhiro Aoyama, Mitsutsugu Itano (Daikin Industries, Ltd.), Toshiki Nakano, Haruaki Akashi (National Defense Academy), Tetsu Mieno (Shizuoka University), Toshio Goto, Masaru Hori (Nagoya University), Masafumi Ito (Wakayama University), Ryohei Itatani (Kyoto University), and Nader Sadeghi (University of Joseph Fourier-Grenoble) I am also grateful to my many colleagues at the JSAP Division of Plasma Electronics, who provided me with valuable opinions and advice.
