Research Topics

以下の研究を推進して参ります。

先端ナノデバイス作製のための原子層プロセス
・Atomic level processing for advanced nanodevices including atomic layer etching and atomic layer deposition.

　　- Understanding atomic level reaction of semiconductor surfaces with chemicals under energy controlled beams.
　　- New atomic level processing of semiconductor devices using new precursors or new etching chemistry.
　　- Oxidation of semiconductor surfaces and functional thin films using energy controlled oxygen beams.

Atomic Layer Deposition (ALD) Process

先端ナノデバイスや量子デバイスのための新材料プロセス
・New materials and process technology for advanced nanodevices and quantum devices.

　　- New channel materials including high mobility materials and 2D materials.
　　- Doping and contact issues for 2D materials.
　　- Interface engineering of new channel materials including gate stack formation and work-function engineering.
　　- Damage free fabrication of quantum devices such as superconducting qubits and silicon qubits.

　　　　　　　　FinFET　　　　　　　　　　Nanosheet　　　　　　　　　　　　　　　　２D Materials