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Professor Samukawa, Assistant Professor Noda attend 63rd AVS International Symposium and Exhibition (November 7 - 11, 2016)
Professor Samukawa and Assistant Professor Noda (by special appointment) participated in the AVS (American Vacuum Society) 63rd International Symposium and Exhibition, held at the Music City Center in Nashville, Tennessee, USA, from November 7 to 11. Professor Samukawa participated as a member of the Executive Committee, and Assistant Professor Noda gave a talk on germanium etching.
At the Business Meeting held on the 18th and at the Executive Committee Meeting later, Professor Samukawa participated in discussions about invited speakers from Japan and recommendations of paper committee members, as well as on the steering of AVS going forward.
Professor Samukawa assumed the position of AVS Fellow in 2009. Compared to that year, the number of members and conference participants has declined today. Restoring membership has become a major theme of discussion. The biggest point is related to the question of why is there is the need for the American Vacuum Society to exist. Collaboration with industry in the U. S. is extremely important. From that standpoint, the existence of the Plasma Science & Technology Division within AVS has taken on special significance. Because of this timing, Professor Samukawa was able to have extremely meaningful discussions as a representative of Japan.
On November 9, Assistant Professor Noda gave a talk on germanium etching using germanium Fin transistors, an area of joint research with AIST, and its application for devices. His lecture was extremely well-received.
