Currently we have the following equipment in our laboratory, which has a floor area of about 90m2: Four vacuum devices that are operated on a regular basis, including one plasma analyzer, two plasma etching reactors, and one multi-beam etching reactor.
To control the plasma, a high-precision plasma analyzer is also necessary. Our lab is already capable of
measuring reactive species (electrons, positive and negative ions, radicals, photons, etc.) through the use of
such equipment as: Langmuir probe; UV emission spectrometer; ultraviolet spectrometer; mass analyzer
with attached energy analyzer; infrared diode laser absorption spectrometer (IR-LAS); and neutralization
measuring device. We have almost completed construction of the duct, ventilation and plumbing
systems and related facilities, so that we can soon start full-scale research. During this fiscal year (2001), we will prepare to expand our research range with additional equipment such as a surface reaction analyzer and plasma CVD device. Also, because the
laboratory is an educational adjunct for students specializing in mechanical in telligence engineering, we have access to the facilities in Venture Business Laboratory and Micro/nanomachine Building and are engaged in prototype device construction and various types of analysis using these facilities.