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Dr. Samukawa gives invited lecture at 82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes (Dec. 7, 2017)
Dr. Samukawa gave an invited lecture at the 82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes held at the Bankoku Shinryokan in Nago City, Okinawa Prefecture from Dec. 4-7. Researchers on atomic layer processes gathered from the United States, EU, and Japan, and a lively discussion ensued.
Dr. Samukawa spoke about silicon and germanium "Fin structure" etching as representative of the atomic layer etching process, demonstrated the importance of suppression of UV light damage, and fielded many questions.
Dr. Samukawa had a full night and two days of work, but on the evening of the 6th, he also participated in a retirement ceremony held over dinner for Keio University Professor Makabe. During his time at NEC, Dr. Samukawa was discovered by Prof. Makabe, who was then secretary general of the Japan Society of Applied Physics Division of Plasma Electronics, so Dr. Samukawa is very indebted to him. Also, old friends of 20 years from the United States and the EU gathered, so it was a pleasant and memorable time.
