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Dr. Seiji Samukawa elevated to Institute of Electrical and Electronic Engineers (IEEE) Fellow
Dr. Samukawa was awarded the grade of Institute of Electrical and Electronic Engineers (IEEE) Fellow. This is in recognition of his "contributions to damage-free plasma processing for nano-device manufacturing."
With a long history dating back to 1884, IEEE is one of the largest international technical professional organizations in the world, consisting of 425,000 members from 160 countries. Every year, the IEEE recognizes elevation to fellow of only a very limited number of people, 0.1% of voting members. An IEEE fellow is first nominated by an appropriate nominator who recommends the candidate to the headquarters, and then those in support (5 to 8 referees and up to 3 optional endorsers) validate that nomination. Then, members of the Fellow Review Committee at the headquarters conduct a strict examination of a series of documents including the opinion of the society covering the field of the candidate to decide on elevation.
The review of the elevation to fellow emphasizes that the candidate has made notable achievements in his or her field and acquired unparalleled experience and knowledge. Also, whether those achievements have contributed to the reform and progress of the world is also subject to evaluation. The nominator and referee must prove that the candidate has devised a completely new theory, system, or environment that no one else could achieve or even think of, and thereby brought about innovative changes in the field. Dr. Samukawa's award shows high evaluation of his 30+ years of research activities toward ultra-low damage in semiconductor plasma processes. In particular, the pulse-time-modulated plasma etching technique proposed in 1992 accounts for more than 50% of the etching equipment in sub-22nm semiconductor devices, and the neutral particle beam technology proposed in 2000 is expected to become an indispensable process. Dr. Samukawa's research has received high international evaluation, including prior to this, his selection as an Applied Physics Society Fellow in 2008 and American Vacuum Society (AVS) Fellow in 2009.
The awards ceremony will be held at the IEEE International Electron Device Meeting (IEDM 2018), an international conference in San Francisco, CA, United States, Dec. 3-5, 2018.
